Reservation  -     

Center of MicroNanoTechnology CMi

Photo gallery

More than 600 pictures of the cleanroom are available at: http://mediatheque.epfl.ch/cmi/


Zone 1: Photolithography

YES LPIII, HMDS primer ovenYES LPIII, HMDS primer oven Heidelberg DWL200, Laser lithography systemHeidelberg DWL200, Laser lithography system Rite Track 88 Series, Coater and developer track for positive resistRite Track 88 Series, Coater and developer track for positive resist Sss RC8 Negative Coater, Manual coater for negative resist and hotplatesSss RC8, Manual coater for negative resist and hotplates Accu-Plate, Thermal accumulator and hotplate system for post exposure bakeAccu-Plate, system for post exposure bake Sawatec LMS200, Coater for negative resistSawatec LMS200, Coater for negative resist Sawatec HP401Z, Hotplate for Soft-bakeSawatec HP401Z, Hotplate for Soft-bake Sss MA150, Double side mask alignerSss MA150, Double side mask aligner Sss DV10, Developer for mask and thick positive resistSss DV10, Developer for mask and thick positive resist Plade Solvent, Photolithography wet benchPlade Solvent, Photolithography wet bench Zeiss LEO 1550, Scanning electron microscopeZeiss LEO 1550, Scanning electron microscope Nikon Optiphot 200, Optical microscopeNikon Optiphot 200, Optical microscope

Zone 2: Plasma etch - wet etch

Alcatel AMS 200 DSE, Plasma etcher - Fluorine chemistryAlcatel AMS 200 DSE, Plasma etcher - Fluorine chemistry Alcatel 601E, Plasma etcher - Fluorine chemistryAlcatel 601E, Plasma etcher - Fluorine chemistry STS Multiplex ICP, Plasma etcher - Chlorine chemistrySTS Multiplex ICP, Plasma etcher - Chlorine chemistry Oxford PRS900, RF and microwave plasma asherOxford PRS900, RF and microwave plasma asher UFT Resist, Wet bench for resist strippingUFT Resist, Wet bench for resist stripping Stripper Micro-onde TePlaStripper Micro-onde TePla Heraeus T6060, Multipurpose ovenHeraeus T6060, Multipurpose oven Plade Oxide, Wet bench for oxide etchPlade Oxide, Wet bench for oxide etch Plade Metal, Wet bench for metal etchPlade Metal, Wet bench for metal etch Nikon Optiphot 200, Inspection microscopeNikon Optiphot 200, Inspection microscope Miele G7735 C2, Cassettes and box washerMiele G7735 C2, Cassettes and box washer

Zone 3: Diffusion, oxidation, LPCVD deposition

Centrotherm furnace 1, stack with 4 tubes: LPCVD poly, LPCVD Nitride, Alloy, POCl3Centrotherm furnace 1: LPCVD poly, Nitride, Alloy and POCl3 Centrotherm furnace 2, stack with 4 tubes: Densification, Wet Oxide, Gate Oxide, DiffusionCentrotherm furnace 2: Densification, Wet Ox., Gate Ox., Diff. Centrotherm furnace 3, stack with 2 tubes: LPCVD LTO, MEMS OxideCentrotherm furnace 3: LPCVD LTO, MEMS Oxide Wet bench for resist strip - piranha baths, organics bathsWet bench for resist strip - piranha baths, organics baths Plade Reclaim, Nitride, Oxide and Poly strip wet benchPlade Reclaim, Nitride, Oxide and Poly strip wet bench Elgera, Wet bench for tube washElgera, Wet bench for tube wash MDS CSM/2VF6, Semiconductor measurement system, C-V plotterMDS CSM/2VF6, Semiconductor measurement system Nikon Optiphot 150Atmospheric Plasma System SURFX3, Atmospheric Plasma System SURFX3 Mactronix HZN4-625P5, Horizon wafer transfer machineMactronix HZN4-625P5, Horizon wafer transfer machine Storage cabinetStorage cabinet SpectroellipsometerSpectroellipsometer Nanospec AFT-6100, Spectro-reflectometerNanospec AFT-6100, Spectro-reflectometer

Zone 4: PECVD, PVD, RTP

Alcatel EVA-600, E-gun and Joule effect evaporatorAlcatel EVA-600, E-gun and Joule effect evaporator Balzers BAS-450, Single chamber multi-target sputtering systemBAS-450, Single chamber multi-target sputtering system Leybold-Optics LAB-600H, E-gun and thermal evaporator, Ion source, Lift-off depositionLeybold-Optics LAB-600H, E-gun and thermal evaporator Pfeiffer Vacuum SPIDER-600, High vacuum sputter cluster system (4 chambers)Pfeiffer SPIDER-600, High vacuum sputter cluster system KLA Tencor OmniMap RS75, Resistivity meter four-point measurementsTencor OmniMap RS75, Resistivity meter four-point Nikon OPTIPHOT-150, Inspection microscope Mecanical Surface Profiler DektakXTMecanical Surface Profiler DektakXT Depot Film mince par ALDDepot_Film mince par ALD Inspection microscopeInspection microscope

Zone 5: Back end

Plade Six Sigma, Wet bench for anisotropic silicon etching (KOH)Plade Six Sigma, Wet bench for anisotropic silicon etching (KOH) Desaules, Wet bench for electroplatingDesaules, Wet bench for electroplating Prettl, Wet bench for porous silicon etchingPrettl, Wet bench for porous silicon etching Prettl, Wet bench for miscellaneous applicationsPrettl, Wet bench for miscellaneous applications Coillard and Tousimis Automegasamdri 915B, Wet bench for HF releaseCoillard and Tousimis Automegasamdri 915B for HF release Idonus HF VPE-100, Hydrofluoric acid vapor phase etcherIdonus HF VPE-100, Hydrofluoric acid vapor phase etcher Tepla 300, Microwave plasma stripperTepla 300, Microwave plasma stripper Lambda Physics, Laser excimerLambda Physics, Laser excimer Nikon MM40, Inspection and 2-D metrology microscopeNikon MM40, Inspection and 2-D metrology microscope Steag Mecapol E 460, Chemical-mechanical polishingSteag Mecapol E 460, Chemical-mechanical polishing Coillard and Tousimis Automegasamdri 915B, Critical point dryerCoillard and Tousimis Automegasamdri 915B, Critical point dryer Cyclic Voltammetric Stripping(CVS)Cyclic Voltammetric Stripping(CVS)

Zone 6: Initial training

Sss RC-8 THP positive coaters, Manual coaters for positive resist (2 units)Sss RC-8 THP positive coaters (2 units) Sss MA6/BA6, Double side mask aligner and bond alignerSss MA6/BA6, Double side mask aligner and bond aligner Sss SB6, Vacuum anodic bonderSss SB6, Vacuum anodic bonder EVG150, Coater and developer system for positive resistEVG150, Coater and developer system for positive resist Coillard Photolithography, Wet bench for resist develop and resist stripCoillard wet bench for resist develop and resist strip Coillard etching, Wet bench for oxide and metal etchCoillard etching, Wet bench for oxide and metal etch Plade miscellaneous, Wet bench for miscellaneous applicationsPlade miscellaneous applications Nikon 200, Inspection microscopeNikon 200, Inspection microscope Vacotec, Basic Joule effect evaporatorVacotec, Basic Joule effect evaporator YES LPIII, TI prime ovenYES LPIII, TI prime oven Nikon Eclipse LV150Nikon Eclipse LV150

Zone 7 and 8: Nanotools

FEI Nova 600 NanoLab, Dual Beam (SEM/FIB)FEI Nova 600 NanoLab, Dual Beam (SEM/FIB) Vistec EBPG5000, Electron Beam Lithography SystemVistec EBPG5000, Electron Beam Lithography System EBEAM_CoaterEBEAM_Coater EBEAM_Wet_Bench_PhotoresistEBEAM_Wet_Bench_Photoresist EBEAM_Wet_Bench_SolventEBEAM_Wet_Bench_Solvent Leica_StereomicroscopeLeica_Stereomicroscope Nikon_StereomicroscopeNikon_Stereomicroscope Storage_CabinetStorage_Cabinet

Zone 9: Dicing

DISCO DAD 321, Automatic dicing sawDISCO DAD 321, Automatic dicing saw

Zone 10 Parylene

Alcatel ASM 180T, Helium leak detectorAlcatel ASM 180T, Helium leak detector

Zone 11

Despatch_Benchtop_oven_LCD1-16N-3Despatch_Benchtop_oven_LCD1-16N-3 Oven_Herneus_250COven_Herneus_250C Laminateur_UVtapeLaminateur_UVtape Lampe_UVLampe_UV Materials_PrinterMaterials_Printer Cutter_PlotterCutter_Plotter Nikon_StereomicroscopeNikon_Stereomicroscope Wafer_GrinderWafer_Grinder Automatic_Wafer_Cleaning_SystemeAutomatic_Wafer_Cleaning_Systeme DP650DP 650

Zone 12

MicorscopeMicorscope Mixer_DessicatorMixer_Dessicator Harrich_O2Harrich_O2 Spin_Coater_PDMSSpin_Coater_PDMS Oven_80COven_80C PuncherPuncher Storage_Cabinet_for_BaseStorage_Cabinet_for_Base Storage_Cabinet_for_ChemicalStorage_Cabinet_for_Chemical Wet_Bench1Wet_Bench Wet_Bench2Wet_Bench

Zone 13

Baths_for_Arias_Wet_BenchBaths_for_Arias_Wet_Bench Wet_Bench_SolventWet_Bench_Solvent HMDS_Vapor_Prime_HotplateHMDS_Vapor_Prime_Hotplate Spin_Coater_Sawatec_LSM-250_for_SU8Spin_Coater_Sawatec_LSM-250_for_SU8 Hotplate_Sawatec_HP-200-BM_for_SU8Hotplate_Sawatec_HP-200-BM_for_SU8 Sawatec_machine_coater+bakeSawatec_machine_coater+bake Photoresist_Spin_CoaterPhotoresist_Spin_Coater Mask_Aligner_Karl_SussMask_Aligner_Karl_Suss Nikon_StereomicroscopeNikon_Stereomicroscope PPDMSPPDMS

Zone 14

Wet_BenchWet_Bench Wet_Bench_ACIDWet_Bench_ACID Wet_Bench_BASEWet_Bench_BASE Wet_Bench_STANGLEWet_Bench_STANGLE Storage_Cabinet_for_SolventStorage_Cabinet_for_Solvent Storage_Cabinet_for_BASEStorage_Cabinet_for_BASE Storage_Cabinet_for_ACIDStorage_Cabinet_for_ACID Oven_Heraeus_140COven_Heraeus_140C Glassware_Washer_SMEGGlassware_Washer_SMEG

Zone 15

Veeco Wyko NT1100, Optical profilerVeeco Wyko NT1100, Optical profiler AFM_Dimension_Icon_FastScanAFM_Dimension_Icon_FastScan Alpha_StepAlpha_Step Prob_Station+Parametter(Floor)Prob_Station+Parametter(Floor) Scanning_Electron_Microscope_Zeiss_MerlinScanning_Electron_Microscope_Zeiss_Merlin Spectro_F20-UVSpectro_F20-UV

Maintenance tools

Alcatel ASM 180T, Helium leak detectorAlcatel ASM 180T, Helium leak detector --> Balzers QMS200,  Mass spectrometer gas analyzerBalzers QMS200, Mass spectrometer gas analyzer MetOne, Laser particle counterMetOne, Laser particle counter

Cleanroom slide show