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LOR 5A coating

 

LOR 5A on ACS 200 Gen 3

In CMi, LOR 5A is coated on the ACS 200 Gen 3 automatic coater, and associated with standard positive tone photoresists. It is also available as standalon coating for sacrificial layer applications.

Standard sequences are listed below, for both layers:

1st layer : LOR
Sequence n° & name Resist type spin speed [rpm] Cure time [mm:ss] LOR thickness [µm]
0171-CMi.4in.AZ1512 1um1.onLOR.0um48
LOR 5A
4500
04:10
0.48
0172-CMi.4in.AZ1512 1um5.onLOR.0um82
LOR 5A
1200
04:10
0.82
0173-CMi.4in.AZECI 0um6.onLOR.0um48
LOR 5A
4500
04:10
0.48
0174-CMi.4in.LOR 0um48.only
LOR 5A
4500
05:00
0.48
0175-CMi.4in.LOR 0um82.only
LOR 5A
1200
05:00
0.82

Spin time is 30 seconds. Softbake is performed at minimum proximity gap. Temperature is 190 °C (over glass transition) for double layer sequences and 160 °C for single layer sequences.

2nd layer : Positive resist (coated after 1st LOR "bottom" layer is coated and dried)
Sequence n° & name Resist type spin speed [rpm] Softbake time [mm:ss] Resist thickness [µm]
0171-CMi.AZ1512 1um1.onLOR.0um48
AZ 1512 HS
6000
02:00
1.1
0172-CMi.AZ1512 1um5.onLOR.0um82
AZ 1512 HS
3000
02:00
1.5
0173-CMi.AZECI 0um6.onLOR.0um48
AZ ECI 3007
5800
01:30
0.6

Spin time is 30 seconds. Softbake is performed at minimum proximity gap. Temperature is 100°C.

Alternate coating sequences (for different bake temperatures, spin speed, or options) can be edited based on user's requests. Please contact the photolithography staff for guidance.

LOR 5A on manual coaters

Please use the following spincurve when selecting the rotation speed to achieve a specific thickness. Spin time should be 45 seconds minimum. A low RPM spreading step is recommended for LOR 5A.

   LOR 5A Spincurve

On a contact hotplate, the softbake temperature should be 190C and softbake time 4 minutes.

Spincurves of the associated positive tone photoresists can be found in each specific process flow : AZ 1512 HS, AZ ECI, AZ 9200.