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AZ40XT Develop

 

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AZ 40XT Development

 

The recommended developer for AZ 40XT is AZ 726 MIF, an organic solution based upon TMAH.

IMPORTANT:
After development, a spin-rinse-dryer (SRD) step with DI water is mandatory to avoid cross contamination and damage on equipments (chuck in etcher) in further processing steps.

AZ 40XT on ACS200 Gen 3

Development sequences for AZ 40XT on the ACS200 Gen 3 are listed below:

Sequence Number
Recipe name PR thickness [m]
Total contact time [s]
0961
CMiDev.AZ40XT 40um
40
180
0962
CMiDev.AZ40XT 60um
60
240
0963
CMiDev.AZ40XT 90um
85
300

Puddle method is used for the development with intermediate spin-clean steps. No Softbake is applied in order to preserve vertical PR side walls.

 

AZ 40XT manual development

AZ 40XT is a chemically amplified resist with a high development rate compared to other positive resists. Typical development times in AZ726 MIF will be around 45 seconds per 10 micron of resist.