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AZ1512 spin


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AZ1512 HS Coating


AZ1512 HS on ACS200 Gen 3

On the ACS200 Gen 3 coater, standard coating sequences are identified by a four digit code "XXXX". The first two digits identify the options (surface treatment, edge bead removal, ...) while the last two digits identify the resist (AZ1512) and thickness.

First digits Coating option --> Last digits Spin speed [rpm] Softbake time [mm:ss] PR thickness [µm]
HMDS / NoEBR (topEC) XX01 6000 01:30
Dehydrate / NoEBR (topEC) XX03 4000 01:30
HMDS / EBR XX04 3000 01:30
Dehydrate / EBR XX05 1800 01:30

Spin time is 30-40 seconds. Softbake is performed at minimum proximity. Softbake temperature is 112°C for all options.

Alternate coating sequences (for different bake temperatures, spin speed, or options) can be edited based on user's requests. Please contact the photolithography staff for guidance.

AZ1512 HS on EVG 150

To maintain a high wafer throughput with AZ 1512 HS coating on the EVG 150, the default recipes are without dehydratation step.

Standard recipes (single layer coating) are listed below: Database file name : AZ1512_1to2um_Std_x_y

Recipe name Spin speed [rpm] Softbake time [mm:ss] PR thickness [µm] Alternate Options
AZ1512_1um1 6000 01:30 1.1 NoEBR
AZ1512_1um3 4000 01:30 1.3 NoEBR
AZ1512_1um5 3000 01:30 1.5 NoEBR
AZ1512_1um6 2800 01:30 1.6 NoEBR
AZ1512_2um 1800 01:30 2.0 NoEBR

Spin time is 30 seconds. Softbake is performed at 250µm proximity. Softbake temperature is 112°C for all options except for "Quartz" (121°C).

Alternate databases are available for specific situations :

AZ1512 HS on manual coaters

Please use the following spincurve when selecting the rotation speed to achieve a specific thickness. Spin time should be 45 seconds. A low RPM spreading step is not necessary for this resist.

   AZ 1512 Spincurve

On a contact hotplate, the softbake temperature should be 100°C and softbake time 30 seconds plus an additionnal 30 seconds per µm of resist.