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Center of MicroNanoTechnology CMi

AZ1512HS Expose

 

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AZ1512 HS Exposure

 

AZ1512 HS Exposure Dose

The following table lists the recommend dose "to clear" for AZ 1512 HS coated on silicon wafers. It is recommended to perform a contrast curve / exposure matrix calibration for wafers other than silicon.

Illumination:  Broadband* i-line (355-365 nm) h-line (405 nm)
Equipment:  MABA6, MA6 Gen3 (no filter) VPG 200, MA6 Gen3 (filter), MJB4  MLA 150
PR thickness [m]  Dose [mJ/cm2]+  Dose [mJ/cm2]++  Dose [mJ/cm2]+++
1.1 30 32 55
1.3 40 42 65
1.5 47 49 75
1.6 50 52 80
2 60 64 102
 2.6 80 85 124

* Mercury Lamp, Mask Aligner with UV400 configuration & no filter / + Based on intensity readings from Süss optometer broadband CCD / ++ Based on intensity readings from Süss optometer i-line CCD / +++ Based on MLA150 internal dose measurements

Equipment

Mask-aligners

Direct laser writers