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Center of MicroNanoTechnology CMi

PR vs Equipment

 

Photoresist Selection Photoresist Table Equipment Compatibility Definitions

Equipment Table

The following table is a list of the photolithography equipment currently available at CMi. The list contains the following informations:

Please note that certain tool requires an intervention of the CMi Staff and/or additionnal user training to operate in specifc configurations.

Equipment

Zone

Substrate Size Compatibility

Maximum wafer thickness

Photoresist Availability/Compatibility

Configurations* (syringe, tool setup), requires booking and STAFF intervention

Automatic Coater & Developer
ACS 200 Gen 3 1 100, 150 mm 1.5mm AZ1512, AZ9221, AZ9260, AZ ECI 3007, AZ ECI 3027, LOR 5AAZ9207, AZ 40XT
Ritetrack 88 1 100mm only 1.5mm AZ ECI 3007, AZ ECI 3027, AZ 9221  
EVG 150 6 100mm only 1.5mm AZ1512, AZ9260 AZ nLOF 2020, Spray Coating
Manual Coater
SSE Coater 13 Any, 5mm*5mm minimum none Novolak-based photoresists
RC8 6 Any, 5mm*5mm minimum none Novolak-based photoresists

 

Sawatec LSM-200 1 Any, 5mm*5mm minimum none SU-8*, Polyimide (PI 2610, PI 2611)* *configuration mandatory
Sawatec LSM-250

13

Any, 5mm*5mm minimum none SU-8
Laurell WS-650-23

13

Any, 10mm*10mm minimum none Non-photosensitive thin films *contact CMi STAFF
Mask Aligner
MA-6 Gen 3 1

50, 100, 150mm

chips*

4mm Compatible with all photoresists

Talbot lithography, Greyscale (x- y-sweep) lithography

*contact CMi STAFF

MA-6 6 50, 100, 150mm 4mm Compatible with all photoresists BA-6 (bond-aligner)
MJB4 13

50, 100, 150mm

chips*

4mm Compatible with all photoresists *contact CMi STAFF
Direct Writing
VPG 200 5 100, 150, 200mm

4", 5", 6", 7" Cr blanks

4mm Compatible with all photoresists
MLA 150 5 Any, 5mm*5mm minimum 4mm Compatible with all photoresists

 

Photoresist Selection Photoresist Table Equipment Compatibility Definitions