Reservation  -     

Center of MicroNanoTechnology CMi

Pattern transfer - conceptual summary


Photolithography - pattern transfer

When transferring patterns, confusion arises from mask polarity and mask parity, from mask tone and photoresist tone. Read and understand this primer on graphical pattern transfer. Below next paragraph find its summary page.

The talking points are the following:

Check out alternate points of view: Stanford Nanofabrication Facility: Photomask Basics, [local copy] As it is the case for your own eyes, two points of view give you in-depth perception, stereoscopic comprehension of the problem, and therefore a better perspective.