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Nanoscribe Photonic Professional GT

 

Nanoscribe Photonic Professional GT+

Nanoscribe

Precautions and Warnings

The microscope objectives used with the Nanoscribe Photonic Professional GT equipment are extremely sensitive and expensive. Be careful when handling them, during mounting, dismounting and cleaning steps!
Cleaning of the objective lens is mandatory after each writing session in oil immersion or DILL exposure modes! Please immediately inform the CMi staff in case of problems with the objectives.

 Equipment sensitive to vibrations: Make sure not to touch the anti-vibration table, especially during writing!


Table of content: CMI

  1. Introduction
  2. Equipment Description
  3. User Manuals
  4. Links
  5. Pictures Gallery

I. Introduction CMI

The Nanoscribe Photonic Professional GT is a 3-dimension (3D) nanoprinter, using two-photon absorption from an infrared (780nm) femtosecond laser to expose and polymerize UV-sensitive photoresists including standard i-line photoresists. The infrared laser is focussed through a microscope objective and the light intensity at the focal point is sufficient to pass the threshold of two-photon absorption mechanism, which means that the polymer will absorb two infrared photons simultaneously producing an energy transition in the UV to initiate the photo-polymerization reaction.

The voxel (3D pixel) is scanned inside the photoresist using three different displacement methods: a coarse stage with a precision lower than 1.5µm to move between different exposure fields, a high precision piezo-stage with a travel range of 300µm in all directions to move the wafer sample during printing (PiezoScan mode), and ultrafast galvo-mirrors to scan the laser focal point in x- and y- directions through the lens (GalvoScan mode).

Several objectives are available providing different magnifications: 20x (air), 10x (immersion), 25x (immersion), 63x (immersion) in order to optimize resolution and printing speed. To achieve the highest resolution (< 200nm lateral dimensions), the 63x objective is used with Nanoscribe IP-photoresists in dip-in laser lithography (DILL) mode, which means the lens will dip in the liquid resist to provide refractive-index matching and increase the numerical aperture of the lens.

The equipment also offer options for tilt-correction (piezo-scan mode only) and for alignment on existing wafer/sample topography.

The Nanoscribe Photonic Professional GT comes with a powerful slicing/hatching software called Describe that will convert a CAD-generated 3D structure with .STL format to the language of the equipment and generate your exposure job. Learning to use Describe is mandatory before organizing any training session on the Photonic Professional GT. Please find the manual here: click here


II. Equipment Description CMI

Objectives and resolution:

The Photonic Professional GT comes with three interchangeable objectives with 20x (air), 25x (immersion), 63x (immersion) magnification. The choice of the objective will have a direct effect on the voxel dimensions (resolution) and writing speed, according to the table below. Note that, due to the nature of focalisation through a lens, the voxel has an oval shape with a typical aspect ratio (z-/x- axis) of about 3.5.

3D Voxel dimensions
63x objective for high resolution
3D Voxel dimensions
Objective x-/y- diameter z- height
63x (immersion) < 200nm < 700nm
25x (immersion) < 600nm < 2um
10x (immersion) < 1.2um < 4.5um
20x(air) <800nm <5um

Configurations:

The Photonic Professional GT is a very flexible equipment which can write with several different configurations depending on the target application. Below are the three standard configurations that the user should consider:

High Resolution 3D DILL mode (63x / IP-Dip / Quartz substrates)

In this mode, the IP-Dip photoresist, dropcasted on the sample, is combined with the 63x immersion objective to produce 3D structures of the highest resolution (< 200nm, x- and y- directions) without any aberrations and no structure height limitations.
Any substrates can be used as long as the refractive index contrast, with IP-Dip, is Δn > 0,05. n(IP-Dip) = 1.52 @ 780nm. Most glass substrates, except fused silica (quartz), will not be detected properly and should be coated with a high refractive index dielectric (SiN, ITO, etc...)
Structure dimensions should be < 1mm to write in a reasonable exposure time.

High resolution IP-Dip configuration

OR

Micro- to Mesoscale 3D DILL mode (25x / IP-S / ITO-coated glass substrates)

In this mode, the IP-S photoresist, dropcasted on the sample, is combined with the 25x immersion objective to produce 3D structures that can extend to several mm of lateral dimensions, at a resolution < 600nm, without any aberrations and no structure height limitations.
Any substrates can be used as long as the refractive index contrast, with IP-S, is Δn > 0,1. n(IP-S) = 1.48 @ 780nm. Most glass substrates will not be detected properly and should be coated with a high refractive index dielectric (SiN, ITO, etc...)
Structure dimensions can extend to several mm while maintaining a good resolution in a reasonable exposure time.

High resolution IP-Dip configuration

OR

FAST (Meso- to Macroscale) 3D DILL mode (10x / IP-Q / Silicon substrates)

In this mode, the IP-Q photoresist, dropcasted on the sample, is combined with the 10x immersion objective to produce 3D structures that can extend to several mm in all directions, at a resolution < 1200nm, without any aberrations and no structure height limitations.
Most glass substrates will not be detected properly due to low refractive index contrast with the resist. Silicon substartes are recommended for this mode.
Structure dimensions can extend to several mm and are printed as fast as possible.

High resolution IP-Dip configuration


Users may also consider the following advanced configurations:

High Resolution 3D conventional OIL IMMERSION mode (63x / any i-line resists / .17mm borosilicate coverslips)

In this mode, the 63x objective is immerged into an oil (immersol 518F) which is indexed-matched with borosilicate glass. The laser is focussed through the thin glass coverslip into the photoresist which is on the top-side of the sample.
The advantage of this mode is that any photo-sensitized polymer (spin-coated photoresists, dropcasted gels, liquids, etc...) can be exposed in high resolution, including Nanoscribe IP-L resist.
Structure dimensions should be < 1mm to write in a reasonable exposure time. The height of the structure is limited to a maximum of 190 um due to the objective working distance limitation.

High resolution IP-Dip configuration

OR

High Resolution 3D inverted OIL IMMERSION mode (63x / spin-coated i-line resists / any substrates)

In this mode, the 63x objective is immerged into an oil (immersol 518F) which is indexed-matched with the photoresist.
The advantage of this mode is that any spin-coated i-line photoresists can be exposed in high resolution without any aberrations and no structure height limitations. The disadvantage is that the oil can contaminate the surface and needs to be blown with N2 gun before developing the photoresist.
Structure dimensions should be < 1mm to write in a reasonable exposure time.

High resolution IP-Dip configuration

OR

"Air" 2D and pseudo 3D lithography mode (20x / spin-coated i-line resists / any substrates)

In this mode, any spin-coated i-line photoresist can be exposed in 2D, similar to the MLA150 or VPG200 equipment. The lateral resolution depends on the photoresist thickness hand can reach < 800nm. This is the fastest writing mode for this equipment but the speed is unfortunately much slower than the dedicated 2D laser writers and you should not expect to write any area bigger than 1cm^2.
The advantage of this mode comes from the possibility to perform pseudo-3D exposure that will let you print any surface profile/angles into the photoresist to create textured surfaces.
Any substrates can be used in this mode.

High resolution IP-Dip configuration

Sample Holders:

The Photonic Professionnal GT comes with different sample holders which are listed in the table below. Most of them are already configured for DILL configurations.

MULTI DILL
9x 25mm*25mm, 700um sample
DILL
1x 25mm*25mm, 700um-thick sample
1x 24-26mm*50-76mm, 1mm-thick microscope slide
1x 30mm diameter, 170um-thick coverslip
1x 25.4mm diameter, 300um-thick coverslip
4" wafer
1x 100mm diameter, 525um-tick wafer (DILL)
MULTI DILL DILL DILL
2" wafer
3x 50mm, 280um-thick wafer (DILL)
10 x 30mm oil
10x 30mm diameter, 170um-thick coverslip (OIL IMMERSION)
5" mask
for self-customizable insets
2inch wafer OIL 5inch mask

Nanoscribe IP-resists:

Nanoscribe supply five different resist formulations, listed below.

Resists
  • IP-Dip: liquid resist for high-resolution DILL mode, to use with the 63x objective.
  • IP-S: liquid resist for micro- and mesoscale DILL mode, to use with the 25x objective. Produces smooth structures with low-shrinkage.
  • IP-Q: liquid resist for meso- and macroscale DILL mode, to use with the 10x objective. Fast 3D print of mm-size parts.
  • IP-L 780: liquid resist for high-resolution OIL IMMERSION mode & through glass configuration, to use with the 63x objective.
  • IP-G 780: gel-like high-resolution resist to write suspended structures.

III. User Manuals CMI


IV. Links CMI


V. Pictures Gallery CMI

this is not the droid you are looking for welcome to the jungle

Micro R2D2
Julien Dorsaz, CMi

A long time ago in a galaxy far, far away.... *star wars theme* …. WAIT! In fact, the story unfolds right here and right now in the CMi with R2D2 battling armies of stormtroopers inside the SEM Merlin chamber. This 3D replica was printed with the Nanoscribe professional photonic GT using two-photon absorption mechanism, in galvoscanning mode. The model is 250 micrometers tall and was written in about 3 hours. One can see the individual 3D voxels in the zoomed inset. Next scientific project: Millenium Falcon.

Exotic Flora
Julien Deceroi, Ecal, Bachelor Project

This 3D creation was replicated with the Nanoscribe so that, in several generations, our childrens will be able to catch a glimpse of what was the world with natural flora still preserved from human activities ... This complex scenery extends to several mm in lateral and vertical dimensions and was written in several blocks, to extend beyond the galvo scan range. Stitching lines are visible in the zoomed onset.