Reservation  -     

Center of MicroNanoTechnology CMi

 DWL200 user guide

Heidelberg DWL200 Prepare your layout Transform data Clean Room Check list Training, Access, Booking and Material order Principle & Photo gallery

Heidelberg Maskless Laser Lithography System

The equipment is produced by Heidelberg Instrument GmbH in Germany.
Fast and flexible system with minimum throughput capacity

CMi purchase a DWL200 system in 2001. Installation with on site acceptance ends in October 2001. Performance of the system is as follow:

Elements of the system

Fabrication grid:  XY table with interferometer position/speed control. 20nm static measurement

  Optical bench:

Original setup comprise only one light source. Main optical path at 413 nm wavelenght (blue) and alignment optics and illumination (yellow)

 
AOM: Acousto-Optic Modulator;  AOD: Acousto-optic deflector. This element deflects the beam in X direction
Write lens is maintained at constant distance (Z axis) to the substrate by an active loop based on N2 presure drop in the lens nozzle.

In 2009 asecond light source based on a solide state blue light emitting diode was installed as a backup fpr easy maintenance and reducing the long system down periode due to a sensitive and ageing technologies of gas laser

Autofocus System:

Autofocus head
Final lens is monted in a pressurized cylinder which can be fine adjusted along z axis using a piezo stacked actuator. Feed back control of focus distance is provided by mesurement of internal pressure P.


Please follow the following links to find out more:

Heidelberg DWL200 Prepare your layout Transform data Clean Room Check list Training, Access, Booking and Material order Principle & Photo gallery