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Center of MicroNanoTechnology CMi

Manual for UltraFab wetbench

chapelle chimique UltraFab

Attention Preliminary and fundamental remarks:
  • SAFETY OPERATOR MANUAL TO OPERATE ON CMi WETBENCHES  (HERE)
  • Metals are strictly forbidden in Piranha baths. Some exceptions are possible but require CMI aggreement.

Contents: CMI

  1. Introduction
  2. Piranha cleaning
  3. Photosensitive resist stripping with Remover 1165

I. Introduction CMI

The baths of the UltraFab wetbench in zone 2 are arranged as depicted in figure 1. A rinsing/drying system from Semitool separates the two parts of this wetbench which is dedicated to photosensitive resist and organics residues removal. The left part (made of white polypropylne) is a Piranha cleaning and the right part (made of inox) is a stripper treatment (Shipley Remover 1165). Each bath is fitted with a timer and a temperature control system. Rinsing baths activation is done using the same type of switch.
Dedicated Teflon carriers are at disposal for 4 and 6 inches wafers.


Disposition des bains

QDR: Quick Dump Rinse (rough rinsing)
CT: Cascade Tank (fine rinsing)
Figure 1: Schematic of the UltraFab wetbench in zone 2

Bath n
1 2 3 4
Contents
H2SO4
(96%)
H2SO4
(96%)
Remover 1165
(Shipley)
Remover 1165
(Shipley)
Use for Piranha
1er Bath
Piranha
2nd Bath
PR stripping
1er Bath
PR stripping
2nd Bath

II. Piranha cleaning CMI

Attention This bath is filled with sulfuric acid. No substrat with metallic layer is allowed, unless agreement with CMi Staff.
  1. Activate the heating system of baths 1 and 2 filled with H2SO4 (it takes > 30min to rise up to 100C from room temperature).
  2. Load the wafers in one of the H2SO4 dedicated Teflon carrier and put the handle on.
  3. Fetch the hydrogen peroxide (H2O2) bottle in the chemical cabinet.
  4. Full protection is now required (nitrile gloves + chemical gloves, apron, face shield) before going further.
  5. Once the temperature (100C) is reached, measure 200ml of H2O2 in the dedicated Teflon burette at the disposal on the wet bench and gently pour the 200ml H2O2 into the first bath filled with H2SO4.
  6. Do the same for the second bath filled with H2SO4.
  7. Gently plunge the carrier into the first bath filled with H2SO4 and close the lid.
  8. Start the timer by using the button Timer 1. Dont change the duration of the timer!
  9. Rinse the chemical gloves!
  10. Rinse the Teflon burette 3 times.
  11. After 5 min, a buzzer indicates the end of the first treatment. Press the button Alarm Silence to stop it and to reset the timer.
  12. Move the carrier to the second bath filled with H2SO4 and close lids.
  13. Start the timer by using the button Timer 2. Dont change the duration of the timer!
  14. After 5 min, another buzzer indicates the end of the second treatment. Press again the button Alarm Silence to stop it and to reset the timer.
  15. Move the carrier to the QDR bath and close lids.
  16. Press the button QDR to start the first rinsing cycle. At the end of it, press Alarm Silence to stop the buzzer.
  17. Move the carrier to the Cascade bath and close lids.
  18. Press the button CASCADE to start the second rinsing cycle. At the end of it, press Alarm Silence to stop the buzzer.
  19. Clean all surfaces of the wet bench with a moist tissue (3 x cleaning/rinsings are necessary).
  20. Remove the handle and put the carrier in the spin rinser and dryer SRD by using the recipe Dry only. Just press STOP and the START.
  21. Dry the entire wet bench with absorbent papers.
  22. Stop the heating system of baths 1 and 2 filled with H2SO4.
  23. When the SRD is finished, get the wafers back and put the carrier where it belongs.
  24. Carefully check the cleanliness of the wet bench before taking off nitrile gloves.
  25. Perform wet bench logout on zone 2 computer.
  26. Bring back the H2O2 bottle or follow the "Empty bottle" procedure!

Any droplets of any kind MUST be removed from the wetbench before leaving it. Suspicious droplets must be cleared using a moist cloth (2 to 3 cleanings/rinsings are necessary) and remaining water droplets must be removed with absorbent paper.

III. Photosensitive resist stripping with Remover 1165 CMI

  1. Activate the heating system of baths 1 and 2 filled with Remover 1165 (it should take approximately 30 min to rise up to 70C from room temperature).
  2. Load the wafers in one of the Remover dedicated Teflon carrier and put the handle on.
  3. Wear nitrile gloves before going further.
  4. Once the temperature (70C) is reached, gently plunge the carrier into the first bath filled with Remover 1165.
  5. Start the timer by using the button Timer 1. Dont change the duration of the timer!
  6. After 5 min, a buzzer indicates the end of the first treatment. Press the button Alarm Silence to stop it and to reset the timer.
  7. Move the carrier to the second bath filled with Remover 1165.
  8. Start the timer by using the button Timer 2. Dont change the duration of the timer!
  9. After 5 min, another buzzer indicates the end of the second treatment. Press again the button Alarm Silence to stop it and to reset the timer.
  10. Move the carrier to the QDR bath.
  11. Press the button QDR to start the first rinsing cycle. At the end of it, press Alarm Silence to stop the buzzer.
  12. Move the carrier to the Cascade bath.
  13. Press the button CASCADE to start the second rinsing cycle. At the end of it, press Alarm Silence to stop the buzzer.
  14. Clean all surfaces of the wet bench with a moist tissue (3 x cleaning/rinsings are necessary).
  15. Remove the handle and put the carrier in the spin rinser and dryer SRD by using the recipe Dry only. Just press STOP and the START.
  16. Dry the entire wet bench with absorbent papers.
  17. Stop the heating system of baths 1 and 2 filled with Remover 1165.
  18. When the SRD is finished, get the wafers back and put the carrier where it belongs.
  19. Carefully check the cleanliness of the wet bench before taking off nitrile gloves.
  20. Perform wet bench logout on zone 2 computer.

Any droplets of any kind MUST be removed from the wetbench before leaving it. Suspicious droplets must be cleared using a moist cloth (2 to 3 cleanings/rinsings are necessary) and remaining water droplets must be removed with absorbent paper.