Reservation  -     

Center of MicroNanoTechnology CMi

Coillard and Tousimis Automegasamdri 915B

Coillard and Tousimis Automegasamdri 915B
Figure 1: Coillard and Tousimis Automegasamdri 915B

Attention Important to know:
  • Safety instruction to read before operating on wetbenches (ICI)
  • Ethanol should be ordered by email or phone to CMi facilities staff (Jean-Marie Voirol or Patrick Madliger) at least half a day before using CPD

Table des matières: CMI

  1. Introduction
  2. Preparation
  3. HF etching
  4. Water rinsing
  5. Water substitution with alcohol
  6. Supercritical Point Drier

I. Introduction CMI

This installation is dedicated to realise HF liquid release of structures with minimum sticking issues.

To begin with, the sacrificial layer (SiO2) is etched with HF 49%. Then, samples are rinsed in deionised water. In the next step, deionised water is replaced by ethyl alcohol. Last but not least, samples are dried in the supercritical point drier using CO2.

The text below describes the procedure to follow carefully.

II. Preparation CMI

III. HF etching CMI

IV. Water rinsing (about 1 hour) CMI

V. Water substitution with alcohol (about 20 minutes) CMI

VI. Supercritical Point Drier CMI

IMPORTANT: Ethanol should be ordered by email or phone to CMi facilities staff (Jean-Marie Voirol or Patrick Madliger) at least half a day before using CPD

Graph
Figure 23: At the very beginning the CO2 is at the liquid phase.
During the HEAT mode, the pressure and the temperature are increased (A -> B -> C) in order to reach the critical phase.
During the BLEED and VENT mode the pressure and the temperature are decreased to reach the gaseous phase (C - > D -> E).