Reservation  -     

Center of MicroNanoTechnology CMi

Ebeam lithography

Electron beam lithography system

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   Raith EBPG5000+, electron beam lithography system
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Manual coater and Develop wet benches

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   ATMsse OPTIspin SB20, manual coater, ebeam resists
   Plade solvents wet bench, ebeam resist developing
   Water/Base wet bench, ebeam resist developing
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Hot plates and Dryer

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   Präziterm, hot plate, dehydration and soft bake
   SAWATEC HP-200, hot plates, dehydration and soft bake
   Terra universal cabinet, dryer, to keep equipment clean and dry
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Schools

Institutes