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Ebeam lithography
Photolithography
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Ebeam lithography
Photolithography
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Photolithography
How to select photosensitive resist (PR)
Resist Table
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Examples and Recommended Process
Mask fabrication
Cr mask Process Flow
DWL200 Easy Exposure Setup
Positive PR for deep dry etch and electrodeposition
AZ9260 process flow
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Expose
Data sheet
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Polymer
SU8 mold
Lift-off
LOR double layer
nLoF image reversal
Other process (Non Photo Sensitive)
Polyimide
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Update: 02.07.2009