graph_sti_p.gif
Reservation - Login: Password:
anglais seulement
Schools: Institutes:
EPFL  >  CMI  >  Photo gallery

Photo gallery


Zone 1: Photolithography

YES LPIII, HMDS primer ovenYES LPIII, HMDS primer oven Heidelberg DWL200, Laser lithography systemHeidelberg DWL200, Laser lithography system Rite Track 88 Series, Coater and developer track for positive resistRite Track 88 Series, Coater and developer track for positive resist Süss RC8 Negative Coater, Manual coater for negative resist and hotplatesSüss RC8, Manual coater for negative resist and hotplates Accu-Plate, Thermal accumulator and hotplate system for post exposure bakeAccu-Plate, system for post exposure bake Sawatec LMS200, Coater for negative resistSawatec LMS200, Coater for negative resist Sawatec HP401Z, Hotplate for Soft-bakeSawatec HP401Z, Hotplate for Soft-bake Süss MA150, Double side mask alignerSüss MA150, Double side mask aligner Süss DV10, Developer for mask and thick positive resistSüss DV10, Developer for mask and thick positive resist Plade Solvent, Photolithography wet benchPlade Solvent, Photolithography wet bench Zeiss LEO 1550, Scanning electron microscopeZeiss LEO 1550, Scanning electron microscope Nikon Optiphot 200, Optical microscopeNikon Optiphot 200, Optical microscope

Zone 2: Plasma etch - wet etch

Alcatel AMS 200 DSE, Plasma etcher - Fluorine chemistryAlcatel AMS 200 DSE, Plasma etcher - Fluorine chemistry Alcatel 601E, Plasma etcher - Fluorine chemistryAlcatel 601E, Plasma etcher - Fluorine chemistry STS Multiplex ICP, Plasma etcher - Chlorine chemistrySTS Multiplex ICP, Plasma etcher - Chlorine chemistry Oxford PRS900, RF and microwave plasma asherOxford PRS900, RF and microwave plasma asher UFT Resist, Wet bench for resist strippingUFT Resist, Wet bench for resist stripping Heraeus T6060, Multipurpose ovenHeraeus T6060, Multipurpose oven Plade Oxide, Wet bench for oxide etchPlade Oxide, Wet bench for oxide etch Plade Metal, Wet bench for metal etchPlade Metal, Wet bench for metal etch Nikon Optiphot 200, Inspection microscopeNikon Optiphot 200, Inspection microscope Miele G7735 C2, Cassettes and box washerMiele G7735 C2, Cassettes and box washer

Zone 3: Diffusion, oxidation, LPCVD deposition

Centrotherm furnace 1, stack with 4 tubes: LPCVD poly, LPCVD Nitride, Alloy, POCl3Centrotherm furnace 1: LPCVD poly, Nitride, Alloy and POCl3 Centrotherm furnace 2, stack with 4 tubes: Densification, Wet Oxide, Gate Oxide, DiffusionCentrotherm furnace 2: Densification, Wet Ox., Gate Ox., Diff. Centrotherm furnace 3, stack with 2 tubes: LPCVD LTO, MEMS OxideCentrotherm furnace 3: LPCVD LTO, MEMS Oxide Plade RCA, Pre-oxidation clean wet benchPlade RCA, Pre-oxidation clean wet bench Plade Reclaim, Nitride, Oxide and Poly strip wet benchPlade Reclaim, Nitride, Oxide and Poly strip wet bench Elgera, Wet bench for tube washElgera, Wet bench for tube wash MDS CSM/2VF6, Semiconductor measurement system, C-V plotterMDS CSM/2VF6, Semiconductor measurement system Nikon Optiphot 150, Inspection microscopeNikon Optiphot 150, Inspection microscope Mactronix HZN4-625P5, Horizon wafer transfer machineMactronix HZN4-625P5, Horizon wafer transfer machine Storage cabinetStorage cabinet Philips Plasmos SD 2300, EllipsometerPhilips Plasmos SD 2300, Ellipsometer Nanospec AFT-6100, Spectro-reflectometerNanospec AFT-6100, Spectro-reflectometer

Zone 4: PECVD, PVD, RTP

Alcatel EVA-600, E-gun and Joule effect evaporatorAlcatel EVA-600, E-gun and Joule effect evaporator Balzers BAS-450, Single chamber multi-target sputtering systemBAS-450, Single chamber multi-target sputtering system Leybold-Optics LAB-600H, E-gun and thermal evaporator, Ion source, Lift-off depositionLeybold-Optics LAB-600H, E-gun and thermal evaporator Pfeiffer Vacuum SPIDER-600, High vacuum sputter cluster system (4 chambers)Pfeiffer SPIDER-600, High vacuum sputter cluster system Veeco Wyko NT1100, Optical profilerVeeco Wyko NT1100, Optical profiler KLA Tencor OmniMap RS75, Resistivity meter four-point measurementsTencor OmniMap RS75, Resistivity meter four-point Tencor Alpha-Step 500, Surface profilerTencor Alpha-Step 500, Surface profiler Nikon OPTIPHOT-150, Inspection microscopeNikon OPTIPHOT-150, Inspection microscope Estek WIS-9000, On-wafer particles counterEstek WIS-9000, On-wafer particles counter Nikon DIGIMICRO, Wafer thickness measurementNikon DIGIMICRO, Wafer thickness measurement

Zone 5: Back end

Plade Six Sigma, Wet bench for anisotropic silicon etching (KOH)Plade Six Sigma, Wet bench for anisotropic silicon etching (KOH) Desaules, Wet bench for electroplatingDesaules, Wet bench for electroplating Prettl, Wet bench for porous silicon etchingPrettl, Wet bench for porous silicon etching Prettl, Wet bench for miscellaneous applicationsPrettl, Wet bench for miscellaneous applications Coillard and Tousimis Automegasamdri 915B, Wet bench for HF releaseCoillard and Tousimis Automegasamdri 915B for HF release Idonus HF VPE-100, Hydrofluoric acid vapor phase etcherIdonus HF VPE-100, Hydrofluoric acid vapor phase etcher Tepla 300, Microwave plasma stripperTepla 300, Microwave plasma stripper Süss PM8, Manual prober stationSüss PM8, Manual prober station Lambda Physics, Laser excimerLambda Physics, Laser excimer Nikon MM40, Inspection and 2-D metrology microscopeNikon MM40, Inspection and 2-D metrology microscope Steag Mecapol E 460, Chemical-mechanical polishingSteag Mecapol E 460, Chemical-mechanical polishing Coillard and Tousimis Automegasamdri 915B, Critical point dryerCoillard and Tousimis Automegasamdri 915B, Critical point dryer

Zone 6: Initial training

Süss RC-8 THP positive coaters, Manual coaters for positive resist (2 units)Süss RC-8 THP positive coaters (2 units) Süss MA6/BA6, Double side mask aligner and bond alignerSüss MA6/BA6, Double side mask aligner and bond aligner Süss SB6, Vacuum anodic bonderSüss SB6, Vacuum anodic bonder EVG150, Coater and developer system for positive resistEVG150, Coater and developer system for positive resist Coillard Photolithography, Wet bench for resist develop and resist stripCoillard wet bench for resist develop and resist strip Coillard etching, Wet bench for oxide and metal etchCoillard etching, Wet bench for oxide and metal etch Plade miscellaneous, Wet bench for miscellaneous applicationsPlade miscellaneous applications Nikon 200, Inspection microscopeNikon 200, Inspection microscope Vacotec, Basic Joule effect evaporatorVacotec, Basic Joule effect evaporator YES LPIII, TI prime ovenYES LPIII, TI prime oven

Nanotools

FEI Nova 600 NanoLab, Dual Beam (SEM/FIB)FEI Nova 600 NanoLab, Dual Beam (SEM/FIB) Vistec EBPG5000, Electron Beam Lithography SystemVistec EBPG5000, Electron Beam Lithography System

Back end gear outside the clean room

DISCO DAD 321, Automatic dicing sawDISCO DAD 321, Automatic dicing saw

Maintenance tools

Alcatel ASM 180T, Helium leak detectorAlcatel ASM 180T, Helium leak detector Balzers QMS200, Mass spectrometer gas analyzerBalzers QMS200, Mass spectrometer gas analyzer MetOne, Laser particle counterMetOne, Laser particle counter

Cleanroom slide show

© 2008 EPFL, 1015 Lausanne,
contacts Update: 30.01.2009