  anglais seulement
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               |
| Name | Function |
|---|---|
| Prof. Philippe Renaud | Director of CMI |
| Philippe Flückiger | Director of Operations CMI |
| Claudia D'Agostino | Administrative Assistant |
| Georges-André Racine | Photolithography Section Head |
| Jean-Baptiste Bureau | Photolithography Engineer |
| Boris Lunardi | Photolithography Technician |
| Michel Jeanneret | Photolithography Technician |
| Cyrille Hibert | Etching Section Head |
| Samuel Clabecq | Etching and Nanotools Engineer |
| Philippe Langlet | Thin Films Section Head |
| Didier Bouvet | Thin Films, Nanotools, CMP Engineer |
| Pierre-Yves Pfirter | Thin Films, Nanotools, CMP Engineer |
| Guy Clerc | Thin Films Technician |
| Yvan Deillon | Back End, Thin Films, Etching & Computer Technician |
| Kevin Lister | Nanotools Section Head |
| Jean-Marie Voirol | Facilities Manager |
| Nareg Simonian | Facilities and Microtechnics Engineer |
| Zones | Description | Tel. |
|---|---|---|
| 1 & 6 | Photolithography | 3 64 41 (Z1) 3 64 46 (Z6) |
| 2 | Dry and wet etching | 3 64 42 |
| 3 & 4 | Thin Films | 3 64 43 (Z3) 3 64 44 (Z4) |
| 5 & 9 | Back End (Z5) Sawing and Machine Shop (Z9) |
3 64 45 (Z5) 3 64 49 (Z9) |
| 7 & 8 | NanoLabs | 3 64 47 (Z7) 3 64 48 (Z8) |
| Facilities | 3 64 52 |
Organigramme du CMi
Restricted area