Metrology

AFM

Bruker Atomic Force Microscope

Equipment Documentation Responsibles 150mm X 180mm inspectable area with rotating chuck Automated laser and detector alignment <30pm vertical noise with closed-loop Icon scanner High speed imaging with FastScan scanner Location: Zone 15 Manual FastScan scanner Icon scanner D. Bouvet

FIB / SEM

FEI Nova 600 NanoLab, dual beam (SEM/FIB)

Equipment Documentation Responsibles 100, 150 mm wafers and piece parts High resolution SEM imaging (~2nm) from 5 to 30 kV SEM acceleration voltage Cross sections Ion beam patterning (> 100nm) Platinum deposition 30 kV FIB acceleration voltage and some beams at 10 and 5 kV Location: Zone 8 Manual Z. Benes J. Pernollet

Zeiss LEO 1550, scanning electron microscope

Equipment Documentation Responsibles 100, 150 mm wafers, cleaved samples and piece parts High resolution SEM imaging (~5nm) From 0.5 to 10 kV acceleration voltage Location: Zone 1 Manual Z. Benes J. Pernollet

Zeiss MERLIN, scanning electron microscope

Equipment Documentation Responsibles 100 wafers, cleaved samples and piece parts High resolution SEM imaging (<1nm) From 0.02 to 30 kV acceleration voltage SE, In-Lens and Energy Selective Backscatter detectors EDX Analysis Location: Zone 15 Manual Z. Benes J. Pernollet

Mechanical profilometers

Tencor Alpha-Step 500, surface profiler

Equipment Documentation Responsibles Measurement range in Z : 10 nm to 300 µm Spacial resolution : 10 µm Location: Zone 4 Manuel Manual V. Brodard G. Clerc Ph. Langlet

Bruker Dektak XT, surface profiler

Equipment Documentation Responsibles Measurement range in Z : up to 1mm Step height repeatability: 5A 3D stress and 3D mapping Location: Zone 4 Web manual Printable manual D. Bouvet Ph. Langlet G. Clerc V. Brodard A. Guillet

Nikon DIGIMICRO, feeler

Equipment Documentation Responsibles Measurement range in Z : 2 µm to 500 µm Spacial resolution : 1 mm Location: Zone 4 Manual G. Clerc Ph. Langlet

Optical measurement

Sopra GES 5E, spectroscopic ellipsometer

Equipment Documentation Responsibles Measurement range : 1 nm and more Multi-layers measurements Standard spot diameter : 1 to 5 mm Micro spot diameter : 500 µm Location: Zone 3 Présentation de l'équipement Fondamentaux de l'ellipsométrie Ellipsométrie : Théorie (Restricted) Introduction to ellipsometry Introduction to software Ph. Langlet D. Bouvet

Veeco Wyko NT1100, optical profiler

Equipment Documentation Responsibles Phase shifting interferometry (PSI) for roughness and small steps (< 160 nm) Vertical scanning interferometry (VSI) for rough surface and steps up to 1 mm high PSI vertial resolution : 0.3 nm VSI vertical resolution : 3 nm Spacial resolution : 1.0 µm Location: Zone 15 Manual A. Guillet V. Brodard B. Lunardi C. Hibert P. Langlet G. Clerc

Nanospec AFT-6100, spectroscopic reflectometer

Equipment Documentation Responsibles Measurement range : 10 nm and more Spacial resolution : 10 µm and more Mono and bi-layers measurements Location: Zone 3 Manual G. Clerc Ph. Langlet G.A. Racine

FilMetrics F20-UV, spectroscopic reflectometer

Equipment Documentation Responsibles Thickness measurement - Thickness range : 1nm to 40µm Thickness and n and k measurement - Thickness range : 50nm and up Wavelength range : 200nm - 1100nm Spot size : 1.5mm Measurement of Single layers Measurement of Multilayer stacks Location (tool): Corridor +1 Location (login): Zone 15 User manual Operations manual L. Pethö G.A. Racine Ph. Langlet

Electrical measurement

KLA Tencor OmniMap RS75, resistivity meter four-point measurements

Equipment Documentation Responsibles Mesurement range : 5mOhm/□ to MOhm/□ Location: Zone 4 Manual V. Brodard D. Bouvet G. Clerc P. Langlet

Süss PM8, manual prober station

Equipment Documentation Responsibles Electrical contact with probes (minimum pad size 50x50 µm2) Electrical measurements for resistivity, diode, FET and Bipolar transistors Location: Zone 15 Manual B. Lunardi G.A. Racine

Optical microscopy

Nikon Optiphot 200, inspection microscope

Equipment Documentation Responsibles Objectives : x5, x10, x20, x50, x100 CCD camera Location: Zone 1 Manual B. Lunardi Y. Deillon

Nikon Optiphot 200, inspection microscope

Equipment Documentation Responsibles Objectives : x5, x10, x20, x50, x100 Location: Zone 2 Manual Y. Deillon

Nikon Optiphot 150, inspection microscope

Equipment Documentation Responsibles Objectives : x5, x10, x20, x50, x100 Location: Zone 4 Manual Y. Deillon

Nikon MM 40, inspection and 2-D metrology microscope

Equipment Documentation Responsibles Objectives : x5, x20, x50, x100 X & Y resolution : 1.0 µm Location: Zone 5   B. Lunardi Y. Deillon

Nikon Optiphot 200, inspection microscope

Equipment Documentation Responsibles Objectives : x5, x10, x20, x50, x100 CCD camera Location: Zone 6 Manual B. Lunardi Y. Deillon

Nikon Optiphot 150, inspection microscope

Equipment Documentation Responsibles Objectives : x5, x10, x20, x50, x100 Location: Zone 7   Y. Deillon

Mitutoyo, inspection microscope

Equipment Documentation Responsibles Objectives : x5, x10, x50, x100 Location: Zone 8   Y. Deillon